Work

Diffusion of solvents in thin porous films

Year: 2006

Type: article

Source: Colloids and Surfaces A Physicochemical and Engineering Aspects

DOI: 10.1016/j.colsurfa.2006.10.055

Authors: D. Shamiryan, M.R. Baklanov, P. Lyons, S. Beckx, W. Boullart, K. Maex

Institution: IMEC

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2162394366

FWCI: 0.909

Cites: 15

Cited by: 29

Related to: 10