Work

Sub-Nm Screening Layer Approach for Ultra Shallow Junction Formation

Year: 1999

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-568-15

Authors: M. Hori, T. Miyake, K. Hikazutani, Y. Kataoka, M. Nakamura, T. Wada, M. Kase

Institution: Fujitsu (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2166728126

FWCI: 0.855

Cites:

Cited by: 3

Related to: 10