Work

Epitaxial CoSi2 formation by Co/Hf bilayers on Si(100)

Year: 1997

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/s0167-9317(97)00150-0

Authors: B. Gebhardt, M. Falke, H. Giesler, S. Teichert, G. Beddies, H.-J. Hinneberg

Institution: Chemnitz University of Technology

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2167989082

FWCI: 0.911

Cites: 15

Cited by: 5

Related to: 10