Work

Impacts of a buffer layer and hi-wafers on the performance of strained-channel NMOSFETs with SiN capping layer

Year: 2007

Type: conference-paper

Source: International Semiconductor Device Research Symposium

DOI: 10.1109/isdrs.2007.4422397

Authors: Tzu-I Tsai, Yao-Jen Lee, King-Sheng Chen, Jeff Wang, Chia-Chen Wan, Fu-Kuo Hsueh, Horng-Chih Lin, Tien-Sheng Chao, Tiao-Yuan Huang

Institutions: National Yang Ming Chiao Tung University, University of Waterloo

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2170411366

FWCI:

Cites: 45

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Related to: 10