Work

Transient Enhanced Diffusion of Arsenic by Self-Implantation —The role of As-I clusters—

Year: 2000

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-610-b8.2

Authors: Ryangsu Kim, Takenori Aoki, Yoshikazu Furuta, Hiroyuki Kobyashi, Jianxin Xia, Tomoya Saito, Yoshinari Kamakura, Kenji Taniguchi

Institution: The University of Osaka

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2319956325

FWCI: 0.259

Cites: 19

Cited by: 5

Related to: 10