Work

Rapid Thermal Epitaxy for Device Applications

Year: 1995

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-387-311

Authors: C. A. King, R. W. Johnson, T. Y. Chiu, J. M. Sung, M. Mastrapasqua, M. R. Pinto

Institution: AT&T (United States)

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2324255823

FWCI: 0.479

Cites: 21

Cited by: 1

Related to: 10