Work

Enhanced Dielectric Constant of HfO2 and Al2O3 Thin-Films with Silver Nanoparticles

Year: 2006

Type: conference-paper

Source: ECS Transactions

DOI: 10.1149/1.2355740

Authors: Ramasamy Ravindran, Maslina Othman, Minseong Yun, Nivedita Biswas, Narendra Mehta, Suchi Guha, Keshab Gangopadhyay, Shubhra Gangopadhyay

Institutions: University of Missouri, North Carolina State University, Texas Instruments (United States)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2333329902

FWCI:

Cites:

Cited by: 6

Related to: 10