Work

(Invited) Plasma Process Simulation for Advanced Semiconductor Applications

Year: 2016

Type: conference-abstract

Source: ECS Meeting Abstracts

DOI: 10.1149/ma2016-01/18/1072

Authors: Peter Ventzek, Alok Ranjan, Hirokazu Ueda, Kiyotaka Ishibashi

Institution: Tokyo Electron (Japan)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2339745210

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