Work

Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Photoresist for Bump Plating.

Year: 1993

Type: article

Source: Journal of The Surface Finishing Society of Japan

DOI: 10.4139/sfj.44.490

Author: Hiroshi KOMANO

Institution: Tokyo Ohka Kogyo (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W2517413331

FWCI:

Cites:

Cited by: 1

Related to: 10