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Hiroshi Komano

Observed names: H. Komano, Hiroshi KOMANO, 博司 駒野
Observed institution: Tokyo Ohka Kogyo (Japan)
OpenAlex ID: A5111805199
Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy
2001 · Takeo Watanabe, Hiroo Kinoshita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 37
Advanced Resist Design Using AFM Analysis for ArF Lithography
2003 · Naotaka Kubota, Tomohiko Hayashi, et al. · Journal of Photopolymer Science and Technology · 19
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Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System
2002 · Takeo Watanabe, Hiroo Kinoshita, et al. · Japanese Journal of Applied Physics · 18
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Characteristics of CA Resist in EUV Lithography.
2002 · Kazuhiro Hamamoto, Takeo Watanabe, et al. · Journal of Photopolymer Science and Technology · 16
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Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
2005 · Takeo Watanabe, Hideo Hada, et al. · Japanese Journal of Applied Physics · 13
Resist Outgassing by EUV Irradiation.
2001 · Takeo Watanabe, Kazuhiro Hamamoto, et al. · Journal of Photopolymer Science and Technology · 12
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Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography
2000 · Takeo Watanabe, Hiroo Kinoshita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT
2002 · K. Hamamoto, Takeo Watanabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
2004 · Takeo Watanabe, Kazuhiro Hamamoto, et al. · Japanese Journal of Applied Physics · 8
Thermal Flow Property for 193nm Photoresist with Low Dispersion Polymer
2004 · Tin-Yu Lee, Chao-Ying Yu, et al. · Journal of Photopolymer Science and Technology · 8
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Evaluation of resist outgassing by EUV irradiation
2004 · Hideo Hada, Takeo Watanabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Beneficial Photoacid Generator for CA Resist in EUVL
2007 · Takeo Watanabe, Hideo Hada, et al. · AIP conference proceedings · 4
Mitigation of Low Outgassing and Small Line Edge Roughness for EUVL Resist
2004 · Takeo Watanabe, Hiroo Kinoshita, et al. · Journal of Photopolymer Science and Technology · 4
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Recent Progress in New Acetal-based Resist for Electron Beam Lithography
2003 · Takuma Hojo, Mitsuru Sato, et al. · Journal of Photopolymer Science and Technology · 3
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Investigation of Resist Characteristics of Fluoropolymer for 157nm Lithography.
2002 · Toshiyuki Ogata, Koutaro Endo, et al. · Journal of Photopolymer Science and Technology · 2
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Ultra Thin Film Resist for Low Energy E-beam Projection Lithography.
2002 · Tsuyoshi Nakamura, Kiyoshi Ishikawa, et al. · Journal of Photopolymer Science and Technology · 1
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Resist Characteristics with Electron Beam and SR Exposures.
2000 · Kiyoshi Ishikawa, Mitsuru Sato, et al. · Journal of Photopolymer Science and Technology · 1
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Photoresist with Anti-Cracked and Fine Profile for High Speed Gold Bump Plating
1995 · Koji SAITO, Hiroshi KOMANO, et al. · Denki Kagaku oyobi Kogyo Butsuri Kagaku · 1
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Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Photoresist for Bump Plating.
1993 · Hiroshi KOMANO · Journal of The Surface Finishing Society of Japan · 1
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Resist outgassing characteristics in EUVL
2004 · T. Watanabe, K. Hamamoto, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Potential cause of inhomogencous acid distribution
2004 · H. Yamamoto, T. Kozawa, et al. · International Microprocesses and Nanotechnology Conference (MNC)
Development of fast photospeed chemically amplified resist in EUV lithography
2004 · T. Watanabe, H. Hada, et al. · International Microprocesses and Nanotechnology Conference (MNC)
New polymer for 157-nm single-layer resist based on fluorine-containing acryl copolymer
2001 · Toshiyuki Ogata, Koutaro Endo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
New bottom antireflection coating approach for KrF lithography at sub-150-nm design rule
2000 · Etsuko Iguchi, Hiroshi Komano, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
高速金バンプ用耐クラックおよび微細プロファイルフォトレジスト〔英文〕 (電子材料技術の新展開 )
1995 · 宏二 斉藤, 博司 駒野, et al. · Denki Kagaku oyobi Kogyo Butsuri Kagaku
Works count: 28
Citation count: 174
H-index: 8
I10-index: 7
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