Work

Resist outgassing characteristics in EUVL

Year: 2004

Type: conference-paper

Source: International Microprocesses and Nanotechnology Conference (MNC)

DOI: 10.1109/imnc.2003.1268759

Authors: T. Watanabe, K. Hamamoto, H. Kinoshita, H. Hada, H. Komano

Institution: Tokyo Ohka Kogyo (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2532828237

FWCI:

Cites: 2

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Related to: 10