Author

Kazuhiro Hamamoto

Observed names: K. Hamamoto, Kazuhiro HAMAMOTO

Observed institutions: University of Hyogo, Himeji University, Japan Science and Technology Agency, Centre de Recherche en Économie et Statistique, Hoya (Japan), Hyogo University

OpenAlex ID: A5111573723

Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy

2001 · Takeo Watanabe, Hiroo Kinoshita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 37

Actinic mask metrology for extreme ultraviolet lithography

2004 · H. Kinoshita, T. Haga, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 32

Mask defect inspection using an extreme ultraviolet microscope

2005 · K. Hamamoto, Y. Tanaka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 28

Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation

2005 · K. Hamamoto, Y. Tanaka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 27

Evaluation of Finished Extreme Ultraviolet Lithography (EUVL) Masks Using a EUV Microscope

2003 · Tsuneyuki Haga, Hiroo Kinoshita, et al. · Japanese Journal of Applied Physics · 24

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Aerial Image Mask Inspection System for Extreme Ultraviolet Lithography

2007 · Hiroo Kinoshita, Kazuhiro Hamamoto, et al. · Japanese Journal of Applied Physics · 20

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Fine Pattern Replication by EUV Lithography.

2001 · Kazuhiro Hamamoto, Takeo Watanabe, et al. · Journal of Photopolymer Science and Technology · 19

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Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System

2002 · Takeo Watanabe, Hiroo Kinoshita, et al. · Japanese Journal of Applied Physics · 18

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Phase Defect Observation Using Extreme Ultraviolet Microscope

2006 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Japanese Journal of Applied Physics · 16

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Characteristics of CA Resist in EUV Lithography.

2002 · Kazuhiro Hamamoto, Takeo Watanabe, et al. · Journal of Photopolymer Science and Technology · 16

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Actinic Mask Inspection Using an EUV Microscope –Preparation of a Mirau Interferometer for Phase-Defect Detection–

2005 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Japanese Journal of Applied Physics · 15

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Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope

2006 · Yuzuru Tanaka, Takeo Watanabe, et al. · Japanese Journal of Applied Physics · 13

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Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography

2005 · Takeo Watanabe, Hideo Hada, et al. · Japanese Journal of Applied Physics · 13

Investigation of Contamination Removal from Finished EUVL Mask

2003 · Kazuhiro Hamamoto, Shintaro Takada, et al. · Journal of Photopolymer Science and Technology · 13

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Development of the large field extreme ultraviolet lithography camera

2000 · T. Watanabe, H. Kinoshita, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 13

Resist Outgassing by EUV Irradiation.

2001 · Takeo Watanabe, Kazuhiro Hamamoto, et al. · Journal of Photopolymer Science and Technology · 12

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Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter

2008 · Masafumi Osugi, Kazuumi Tanaka, et al. · Japanese Journal of Applied Physics · 11

Development of fiducial marks on EUV blanks for defect mitigation process

2012 · Takahiro Onoue, Kazuhiro Hamamoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Cleaning Characteristics of Contaminated Imaging Optics Using 172 nm Radiation

2007 · Kazuumi Tanaka, Kazuhiro Hamamoto, et al. · Japanese Journal of Applied Physics · 10

Fine pattern replication on 10 x 10-mm exposure area using ETS-1 laboratory tool in HIT

2002 · K. Hamamoto, Takeo Watanabe, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Phase defect observation using an EUV microscope

2006 · Kazuhiro Hamamoto, Yuzuru Tanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Resist Outgassing Characteristics in Extreme Ultraviolet Lithography

2004 · Takeo Watanabe, Kazuhiro Hamamoto, et al. · Japanese Journal of Applied Physics · 8

Reducing off Hydrocarbon Contaminants for EUVL

2005 · Yuzuru Tanaka, Kazuhiro Hamamoto, et al. · Japanese Journal of Applied Physics · 7

Development of optical component for EUV phase-shift microscopes

2007 · Yoshio Mizuta, Masafumi Osugi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope

2009 · K. Hamamoto, N. Sakaya, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 5

Works count: 47

Citation count: 421

H-index: 13

I10-index: 19