Improved low-k dielectric properties using He/H2 plasma forresist removal
Year: 2008
Type: article
Authors: Adam Urbanowicz, Denis Shamiryan, P. Maršík, Youssef Travaly, Patrick Verdonck, Kris Vanstreels, Abdelkarim Ferchichi, David De Roest, Hessel Sprey, Kiyohiro Matsushita, Shinya Kaneko, N. Tsui, Shijian Luo, Orlando Escorcia, Ivan L. Berry, Carlo Waldfried, Stefan De Gendt, Mikhaı̈l R. Baklanov
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2521290128