Work

Surface Passivation by Amorphous Silicon a-Si: H Thin Film in Presence of the SiNx: H Layer

Year: 2014

Type: conference-paper

Source: HAL

Authors: Kezzoula, F., Mohammed-Brahim, Tayeb, Kechouane, M., Elamrani, A., Menari, H.

Institutions: Institut d'Électronique et des Technologies du numéRique, University of Hassan II Casablanca

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2569800899

FWCI:

Cites:

Cited by:

Related to: 10