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CVD/ALDを用いたCu(Mn)/Co(W)配線システムの構築と3次元アトムプローブによるサブナノ構造・バリヤ性評価
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Year:
2015
Type:
article
Source:
IEICE Technical Report; IEICE Tech. Rep.
Authors:
紘平 嶋,
ユアン ツ,
秀治 清水,
康雄 清水,
健 百瀬,
耕治 井上,
康介 永井,
幸浩 霜垣
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Language:
Japanese
Topic:
Copper Interconnects and Reliability
Subfield:
Electronic, Optical and Magnetic Materials
Field:
Materials Science
Domain:
Physical Sciences
Open Access status:
closed
OpenAlex ID:
W266793984
FWCI:
Cites:
Cited by:
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