Work

Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology

Year: 2018

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.17.4.041010

Authors: Kiyoshi Takamasu, Satoru Takahashi, Hiroki Kawada, Masami Ikota

Institutions: The University of Tokyo, Hitachi High-Tech (Japan), Hitachi (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Japan Society for the Promotion of Science

Award: Practical application of uncertainty estimation method in three dimensional measurement for high precision of next generation three dimensional shape

OpenAlex ID: W2889563408

FWCI: 0.764

Cites: 14

Cited by: 11

Related to: 10