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Hiroki Kawada
Observed names:
H Kawada,
H. KAWADA,
H. Kawada,
Hiroki KAWADA,
Hiroki Kawada Hiroki Kawada
Observed institutions:
Tokyo Institute of Technology,
Canon (Japan),
Waseda University,
Fritz Haber Institute of the Max Planck Society,
Hitachi High-Tech (Japan),
Hitachi (Japan)
show all 6
OpenAlex ID:
A5111765162
Switching and memory phenomena in Langmuir–Blodgett films
1988
·
K. Sakai
, H. Matsuda
, et al.
·
Applied Physics Letters
·
76
Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance
2003
·
Atsuko Yamaguchi
, Ryuta Tsuchiya
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
56
Metrology of LER: influence of line-edge roughness (LER) on transistor performance
2004
·
Atsuko Yamaguchi
, Katsuhiko Ichinose
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
45
Bias-free measurement of LER/LWR with low damage by CD-SEM
2006
·
Atsuko Yamaguchi
, Robert Steffen
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
43
Analysis of Line-edge Roughness in Resist Patterns and Its Transferability as Origins of Device Performance Degradation and Variation
2003
·
Atsuko Yamaguchi
, Hiroshi Fukuda
, et al.
·
Journal of Photopolymer Science and Technology
·
24
PDF
Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology
2005
·
Atsuko Yamaguchi
, Hiroshi Fukuda
, et al.
·
Japanese Journal of Applied Physics
·
21
PDF
Hybrid metrology solution for 1X node technology
2012
·
Alok Vaid
, Alexander Elia
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
20
25 nm pitch comparison between a traceable x-ray diffractometer and a metrological atomic force microscope
2011
·
Ichiko Misumi
, Jun-ichiro Kitta
, et al.
·
Measurement Science and Technology
·
17
PDF
Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope
2008
·
Keiichiro Hitomi
, Yoshinori Nakayama
, et al.
·
Japanese Journal of Applied Physics
·
17
PDF
Photoresist cross-sectional shape change caused by scanning electron microscope-induced shrinkage
2015
·
Takeyoshi Ohashi
, Tomoko Sekiguchi
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
16
PDF
A Discussion on How to Define the Tolerance for Line-Edge or Linewidth Roughness and Its Measurement Methodology
2007
·
Atsuko Yamaguchi
, Robert Steffen
, et al.
·
IEEE Transactions on Semiconductor Manufacturing
·
14
Influence of electron incident angle distribution on CD-SEM linewidth measurements
2006
·
Maki Tanaka
, Chie Shishido
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
Impact of long-period line-edge roughness (LER) on accuracy in CD measurement
2005
·
Atsuko Yamaguchi
, Hiroshi Fukuda
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology
2014
·
Kiyoshi Takamasu
, Haruki Okitou
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
13
In-die overlay metrology by using CD-SEM
2013
·
Osamu Inoue
, Takeshi Kato
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
12
Reduction of surface defects in GaAs layers grown by MBE
1993
·
H. Kawada
, S. Shirayone
, et al.
·
Journal of Crystal Growth
·
12
Linewidth roughness of advanced semiconductor features using focused ion beam and planar-transmission electron microscope as reference metrology
2018
·
Kiyoshi Takamasu
, Satoru Takahashi
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
11
Sub-50-nm pitch size grating reference for CD-SEM magnification calibration
2009
·
Yoshinori Nakayama
, Jiro Yamamoto
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Characterization of line-edge roughness in Cu/low- k interconnect pattern
2007
·
Atsuko Yamaguchi
, Daisuke Ryuzaki
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Sub-nanometer line width and line profile measurement for CD-SEM calibration by using STEM
2011
·
Kiyoshi Takamasu
, Haruki Okitou
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Critical dimension-scanning electron microscope magnification calibration with 25-nm pitch grating reference
2011
·
Yoshinori Nakayama
, Jiro Yamamoto
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
10
Single-shot method for bias-free LER/LWR evaluation with little damage
2007
·
Atsuko Yamaguchi
, Robert Steffen
, et al.
·
Microelectronic Engineering
·
10
Device-correlated metrology for overlay measurements
2014
·
Charlie Chen
, DongSub Choi
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
9
PDF
Precise measurement of photoresist cross-sectional shape change caused by SEM-induced shrinkage
2013
·
Takeyoshi Ohashi
, Tomoko Sekiguchi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Sub-nanometer calibration of CD-SEM line width by using STEM
2010
·
Kiyoshi Takamasu
, Kazuki Kuwabara
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
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Works count:
87
Citation count:
723
H-index:
13
I10-index:
22
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