Work

Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology

Year: 2014

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2046144

Authors: Kiyoshi Takamasu, Haruki Okitou, Satoru Takahashi, Osamu Inoue, Hiroki Kawada, Vimal Kamineni, Abhijeet Paul, A. F. Bello

Institutions: The University of Tokyo, Hitachi High-Tech (Japan), Hitachi (Japan), GlobalFoundries (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1970038271

FWCI: 3.212

Cites: 13

Cited by: 13

Related to: 10