Work

Standard wafer with programed defects to evaluate the pattern inspection tools for 300-mm wafer fabrication for 7-nm node and beyond

Year: 2019

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.18.2.023505

Authors: Susumu Iida, Takamitsu Nagai, Takayuki Uchiyama

Institution: Evolving Nano Process Infrastructure Development Center (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2950583200

FWCI: 0.271

Cites: 28

Cited by: 12

Related to: 10