Work

Line top loss and line top roughness characterizations of EUV resists

Year: 2020

Type: conference-paper

Source: Metrology, Inspection, and Process Control XXXVI

DOI: 10.1117/12.2551623

Authors: Daniel Schmidt, Karen Petrillo, Mary A. Breton, Jennifer Fullam, Sean Hand, Jason Osborne, Weijie Wang, David Fey

Institutions: IBM (United States), Bruker (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3010830625

FWCI: 1.402

Cites:

Cited by: 6

Related to: 10