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Jason R. Osborne

Observed name: Jason Osborne
OpenAlex ID: A5105988198
Advanced measurement and diagnosis of the effect on the underlayer roughness for industrial standard metrology
2019 · Jung-Hwan Kim, Seunghyun Moon, et al. · Scientific Reports · 21
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Advanced CD-AFM probe tip shape characterization for metrology accuracy and throughput
2007 · Hao-Chih Liu, Jason R. Osborne, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Critical dimension AFM tip characterization and image reconstruction applied to the 45-nm node
2006 · Gregory Dahlen, Marc Osborn, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
TEM validation of CD AFM image reconstruction
2007 · Gregory A. Dahlen, Lars Mininni, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17
Recent CD AFM probe developments for sub-45 nm technology nodes
2008 · Hao-Chih Liu, Jason R. Osborne, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Carbon nanotube AFM probes for microlithography process control
2006 · Hao-Chih Liu, David Fong, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
TEM validation of CD AFM image reconstruction: part II
2008 · Gregory A. Dahlen, Hao-Chih Liu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Critical Dimension Atomic Force Microscopy for Sub-50-nm Microelectronics Technology Nodes
2007 · Hao-Chih Liu, Gregory A. Dahlen, et al. · Springer eBooks · 8
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
2014 · Shimon Levi, Ishai Schwarzband, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Line top loss and line top roughness characterizations of EUV resists
2020 · Daniel Schmidt, Karen Petrillo, et al. · Metrology, Inspection, and Process Control XXXVI · 6
High-speed atomic force microscopy for patterned defect review
2013 · Jason Osborne, Shuiqing Hu, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
AFM characterization for Gate-All-Around (GAA) devices
2020 · Mary A. Breton, Jennifer Fullam, et al. · Metrology, Inspection, and Process Control XXXVI · 5
Measurement uncertainty in nanometrology: leveraging attributes of TEM and CD AFM
2007 · Hao-Chih Liu, Gregory A. Dahlen, et al. · Conference proceedings - IEEE Instrumentation/Measurement Technology Conference · 5
Towards development of a sidewall roughness standard
2013 · Aaron Cordes, Ben Bunday, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Device level 3D characterization using PeakForce AFM
2016 · Padraig Timoney, Xiaoxiao Zhang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
3D optical proximity model optimization using inline 3DSEM metrology
2019 · Shimon Levi, Ishai Schwarzban, et al. · Metrology, Inspection, and Process Control XXXVI · 1
Quantitative nanomechanical measurement of electron beam surface modification
2015 · Aaron Cordes, Benjamin Bunday, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 17
Citation count: 150
H-index: 8
I10-index: 6
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