Work

Realizing more accurate OPC models by utilizing SEM contours

Year: 2020

Type: conference-paper

Source: Metrology, Inspection, and Process Control XXXVI

DOI: 10.1117/12.2554527

Authors: Chih-I Wei, Rajiv Sejpal, Yunfei Deng, Ir Kusnadi, Germain Fenger, Masahiro Oya, Yosuke Okamoto, Kotaro Maruyama, Yuichiro Yamazaki, Sayantan Das, Sandip Halder, Werner Gillijns

Institutions: Mentor Graphics (United States), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W3011817644

FWCI: 2.103

Cites:

Cited by: 9

Related to: 10