Plasma halogenated a-C:H as growth inhibiting layer for ASD of titanium oxide
Year: 2020
Type: conference-paper
DOI: 10.1117/12.2551492
Authors: Mikhail Krishtab, Joey Hung, Roy Koret, Igor Turovets, Kavita Shah, Srinivasan Rangarajan, Laxmi Warad, Vanessa Zhang, Rob Ameloot, Silvia Armini
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W3013060733