Work

High Aspect Ratio, High Resolution, and Broad Process Window Description of a Low Loss Photodielectric for 5G HS/HF Applications Using High and Low Numerical Aperture Photolithography Tools

Year: 2020

Type: conference-paper

Source: 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)

DOI: 10.1109/ectc32862.2020.00103

Authors: Colin Hayes, Kevin Wang, Rosemary Bell, Colin Calabrese, Michael Gallagher, Kirk Thompson, Robert K. Barr, Keith Best, Corey Shay, Christian Ayala

Institutions: DuPont (United States), Onto Innovation (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W3048210259

FWCI: 3.246

Cites: 13

Cited by: 9

Related to: 10