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Onto Innovation (United States)
Homepage:
ontoinnovation.com
ROR:
0317a1b85
OpenAlex ID:
I4210138502
Science and engineering for non-noble-metal-based electrocatalysts to boost their ORR performance: A critical review
2022
·
Sanket D. Bhoyate
, Junyoung Kim
, et al.
·
Coordination Chemistry Reviews
·
210
Development of high-performance zinc-ion batteries: Issues, mitigation strategies, and perspectives
2023
·
Teddy Mageto
, Sanket D. Bhoyate
, et al.
·
Journal of Energy Storage
·
87
Developing practical solid-state rechargeable Li-ion batteries: Concepts, challenges, and improvement strategies
2022
·
Teddy Mageto
, Sanket D. Bhoyate
, et al.
·
Journal of Energy Storage
·
53
Controlling the broadband enhanced light chirality with L-shaped dielectric metamaterials
2024
·
Ufuk Kilic
, Matthew Hilfiker
, et al.
·
Nature Communications
·
35
Hydrogen effects on the thermal conductivity of delocalized vibrational modes in amorphous silicon nitride ( a − SiN x : H )
2021
·
Jeffrey L. Braun
, Sean W. King
, et al.
·
Physical Review Materials
·
26
PDF
Solvent-assisted sulfur vacancy engineering method in MoS 2 for a neuromorphic synaptic memristor
2023
·
Jiyeon Kim
, Changik Im
, et al.
·
Nanoscale Horizons
·
24
Efficient pump-probe sampling with a single-cavity dual-comb laser: Application in ultrafast photoacoustics
2022
·
J. Pupeikis
, W. Hu
, et al.
·
Photoacoustics
·
23
Nondestructive characterization of nanoscale subsurface features fabricated by selective etching of multilayered nanowire test structures using Mueller matrix spectroscopic ellipsometry based scatterometry
2020
·
Madhulika Korde
, Subhadeep Kal
, et al.
·
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
·
23
MoTe2 Field-Effect Transistors with Low Contact Resistance through Phase Tuning by Laser Irradiation
2021
·
Geun Yeol Bae
, Jinsung Kim
, et al.
·
Nanomaterials
·
18
PDF
Progress, challenges, and prospects with electrocatalyst (From transition metal oxides to dual-atom catalysts) for oxygen reduction reaction
2024
·
Teddy Mageto
, Sanket Bhoyate
, et al.
·
Molecular Catalysis
·
13
X-ray critical dimension metrology solution for high aspect ratio semiconductor structures
2021
·
Matthew Wormington
, Adam Ginsburg
, et al.
·
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
·
10
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
2025
·
Shiva Mudide
, Nick Keller
, et al.
·
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
·
9
PDF
High Aspect Ratio, High Resolution, and Broad Process Window Description of a Low Loss Photodielectric for 5G HS/HF Applications Using High and Low Numerical Aperture Photolithography Tools
2020
·
Colin Hayes
, Kevin Wang
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
9
Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes
2021
·
George A. Antonelli
, Nick Keller
, et al.
·
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
·
8
Nanocolumnar Metamaterial Platforms: Scaling Rules for Structural Parameters Revealed from Optical Anisotropy
2024
·
Ufuk Kilic
, Yousra Traouli
, et al.
·
Advanced Optical Materials
·
7
PDF
Extremely Large Exposure Field With Fine Resolution Lithography Technology To Enable Next Generation Panel Level Advanced Packaging
2021
·
John Chang
, Timothy Chang
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
7
Adaptive Shot Technology To Address Severe Lithography Challenges For Advanced FOPLP
2020
·
John Chang
, Keith Best
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
6
Nano Horizons: Exploring the untapped power of two-Dimensional materials
2024
·
Junyoung Kim
, Anuj Kumar
, et al.
·
Materials Science and Engineering B
·
5
Analysis of Pattern Distortion by Panel Deformation and Addressing it by Using Extremely Large Exposure Field Fine-Resolution Lithography
2022
·
John Chang
, Corey Shay
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
5
Yield Prediction Technology a Game Changer for Cutting Costs and Reducing Ramp Time in FOPLP Lithography
2025
·
John Chang
, Keith. Best
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
4
Overlay Challenges of Extremely Large Exposure Field, Fine Resolution Lithography Due to Alignment Solution Errors and a Solution Using Early Zone Corrections in Advanced IC Substrates
2024
·
John Chang
, Xing Song
, et al.
·
2022 IEEE 72nd Electronic Components and Technology Conference (ECTC)
·
4
Superlattice effects and limitations of non-destructive measurement of advanced Si/Si1−xGex superlattice structures using Mueller matrix scatterometry and high-resolution X-ray diffraction
2024
·
Ezra Pasikatan
, George A. Antonelli
, et al.
·
Journal of Micro/Nanopatterning Materials and Metrology
·
3
Characteristic Mueller matrix responses and correlation analysis for vertical GAA nanowire structure manufacturing using RCWA simulated spectra
2023
·
Colin Wadsworth
, Ezra Mel B. Pasikatan
, et al.
·
3
Novel inline on-device measurement of silicon nitride lateral recess post channel hole etch with IRCD metrology
2022
·
Nicholas Keller
, Wenmei Ming
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
3
Non-destructive measurement of bottom width in deep trench isolation structures using IRCD metrology
2024
·
Nick Keller
, Marc Poulingue
, et al.
·
2
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Works count:
86
Citation count:
1,611
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