Work

Cleaning substrates and subsequent deposition of coatings with coaxial magnetron discharge

Year: 2021
Type: conference-paper
Abstract: The created experimental magnetron sputtering system allows preliminary cleaning of the substrate surface and subsequent deposition of coatings on long cylindrical products within a single system using a coaxial magnetron discharge at a working gas pressure of 150 mTorr. The coating discharge has reverse electrodes polarity relative to the cleaning discharge. A theoretical calculation of the discharge parameters has been carried out.
Language: English
Open Access status: diamond
OpenAlex ID: W3176184789
FWCI: 0.385
Cites: 4
Cited by: 1
Related to: 10