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酸化還元を利用したULSI-Cu配線形成用CVDプロセスの速度論 (2)

Year: 2008

Type: article

Source: 化学工学会　研究発表講演要旨集化学工学会第73年会

DOI: 10.11491/scej.2008.0.202.0

Authors: 圭雄須佐, 幸浩霜垣

Language: Japanese

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W356254541

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