Work

Effects of Sulfur Passivation on Ge MOS Capacitors with High-k Gate Dielectric

Year: 2007

Type: conference-paper

Source: International Conference on Solid State Devices and Materials (SSDM)

DOI: 10.7567/ssdm.2007.a-2-6

Authors: Ruilong Xie, Chunxiang Zhu

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W417768093

FWCI:

Cites:

Cited by: 1

Related to: 10