Work

Atomic Layer Epitaxy of Copper: Growth and Selectivity in the Cu(II)‐2,2,6,6‐tetramethyl‐3,5‐heptanedionate/ Process

Year: 1998

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.1838738

Authors: Per Maårtensson, Jan‐Otto Carlsson

Institution: Uppsala University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4239606258

FWCI: 1.386

Cites:

Cited by: 119

Related to: 10