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Jan‐Otto Carlsson

Observed names: J.-O. Carlsson, JAN-OTTO CARLSSON, Jan -Otto Carlsson, Jan Otto Carlsson, Jan-Otto CARLSSON, Jan-Otto Carlsson
Institution: Uppsala University
OpenAlex ID: A5111595877
Chemical Vapor Deposition
2009 · Jan-Otto Carlsson, Peter M. Martin · Elsevier eBooks · 217
Atomic Layer Epitaxy of Copper: Growth and Selectivity in the Cu(II)‐2,2,6,6‐tetramethyl‐3,5‐heptanedionate/ Process
1998 · Per Maårtensson, Jan‐Otto Carlsson · Journal of The Electrochemical Society · 119
Selective vapor-phase deposition on patterned substrates
1990 · Jan-Otto Carlsson · Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 75
Atomic Layer Epitaxy of Copper on Tantalum
1997 · Per Mårtensson, Jan‐Otto Carlsson · Chemical Vapor Deposition · 72
Atomic layer deposition of BN thin films
2002 · Björn Mårlid, Mikael Ottosson, et al. · Thin Solid Films · 64
Growth of copper metal by atomic layer deposition using copper(I) chloride, water and hydrogen as precursors
2004 · Tobias Törndahl, Mikael Ottosson, et al. · Thin Solid Films · 62
The Crystal Structure of MnB4.
1970 · Sven Andersson, Jan-Otto Carlsson, et al. · Acta chemica Scandinavica/Acta chemica Scandinavica. B, Organic chemistry and biochemistry/Acta chemica Scandinavica. A, Physical and inorganic chemistry/Acta chemica Scandinavica. Series B. Organic chemistry and biochemistry/Acta chemica Scandinavica. Series A, Physical and inorganic chemistry · 59
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Atomic Layer Deposition of NiO by the Ni(thd)2/H2O Precursor Combination
2009 · Erik Lindahl, Mikael Ottosson, et al. · Chemical Vapor Deposition · 54
Chemical vapour deposition of Cu2O and CuO from CuI and O2 or N2O
1996 · Mikael Ottosson, Jan-Otto Carlsson · Surface and Coatings Technology · 51
Deposition rate and rate-limiting steps in the chemical vapour deposition of boron in a closed system
1980 · Jan-Otto Carlsson · Journal of the Less Common Metals · 48
Chemical vapour deposition of boron carbides in the temperature range 1300–1500 K and at a reduced pressure
1985 · Ulf Jansson, Jan-Otto Carlsson · Thin Solid Films · 45
Copper nanoparticles deposited inside the pores of anodized aluminium oxide using atomic layer deposition
2003 · A. Johansson, T. Törndahl, et al. · Materials Science and Engineering C · 42
Carbon growth by thermal laser-assisted chemical vapour deposition
1992 · Helena Westberg, Mats Boman, et al. · Thin Solid Films · 38
Processes in interfacial zones during chemical vapour deposition: Aspects of kinetics, mechanisms, adhesion and substrate atom transport
1985 · Jan-Otto Carlsson · Thin Solid Films · 38
Phase stability and oxygen doping in the Cu–N–O system
2010 · Anna Fallberg, Mikael Ottosson, et al. · Journal of Crystal Growth · 36
Growth of Copper(I) Nitride by ALD Using Copper(II) Hexafluoroacetylacetonate, Water, and Ammonia as Precursors
2006 · Tobias Törndahl, Mikael Ottosson, et al. · Journal of The Electrochemical Society · 36
A thermochemical model for diamond growth from the vapour phase
1990 · Ji-Tao Wang, Jan-Otto Carlsson · Surface and Coatings Technology · 36
Selective deposition of tungsten—prediction of selectivity
1985 · Jan-Otto Carlsson, Mats Boman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 34
CVD of Copper(I) Nitride
2009 · Anna Fallberg, Mikael Ottosson, et al. · Chemical Vapor Deposition · 33
TEM investigation of CVD graphite on nickel
1994 · Ann-Sofie Johansson, Jun Lu, et al. · Thin Solid Films · 31
Surface migration during diamond growth studied by molecular orbital calculations
1999 · Karin Larsson, Jan-Otto Carlsson · Physical review. B, Condensed matter · 28
Factors influencing the κ-Al2O3 → α-Al2O3 phase transformation during CVD growth
1993 · Eva Fredriksson, Jan-Otto Carlsson · Surface and Coatings Technology · 28
Use of atomic layer epitaxy for fabrication of Si/TiN/Cu structures
1999 · Per Mårtensson, Marika Juppo, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 24
Chemical vapour deposition of TiO and Ti2O3 from TiCl4/H2/CO2 gas mixtures
1995 · Eva Fredriksson, Jan-Otto Carlsson · Surface and Coatings Technology · 21
Chemical vapour deposition of copper on Si(111) and SiO2 substrates
1992 · Christina Lampe-Önnerud, Ulf Jansson, et al. · Journal of Crystal Growth · 20
Works count: 99
Citation count: 1,854
H-index: 23
I10-index: 53
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