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Modification of Porous Ultralow-k Film by Vacuum Ultraviolet Emission

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Year: 2022
Type: article
Source: ACS Applied Electronic Materials
DOI: 10.1021/acsaelm.2c00281
Authors: Alexey I. Zotovich, Sergey M. Zyryanov, Dmitry V. Lopaev, Askar A. Rezvanov, Ahmed G. Attallah, Maciej O. Liedke, Maik Butterling, Maria A. Bogdanova, Alexey S. Vishnevskiy, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander P. Palov, Eric Hirschmann, Andreas Wagner, Sergej Naumov, Konstantin A. Vorotilov, Tatyana V. Rakhimova, Alexander T. Rakhimov, Mikhail R. Baklanov
Institutions: Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Research Institute of Molecular Electronics, Helmholtz-Zentrum Dresden-Rossendorf, Minia University, MIREA - Russian Technological University, Leibniz Institute of Surface Engineering, European Centre for Knowledge and Technology Transfer
Language: English

Topic: Copper Interconnects and Reliability
Subfield: Electronic, Optical and Magnetic Materials
Field: Materials Science
Domain: Physical Sciences

Open Access status: closed

Funders: Russian Science Foundation, Helmholtz Association, Ministry of Science and Higher Education of the Russian Federation
Awards: G1942489586, G2826565104, G4859371483
OpenAlex ID: W4293076754
FWCI: 0.355
Cites: 75
Cited by: 7
Related to: 10
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