Work

Fabrication of MOS devices with extreme ultraviolet lithography

Year: 1996

Type: conference-paper

DOI: 10.1364/eul.1996.a208

Authors: K. B. Nguyen, G. F. Cardinale, D. A. Tichenor, G. D. Kubiak, K. Berger, A. K. Ray-Chaudhuri, Y. Perras, S. J. Haney, R. Nissen, K. Krenz, R. H. Stulen, H. Fujioka, C. Hu, J. Bokor, D. M. Tennant, L. A. Fetter

Institutions: Sandia National Laboratories California, Sandia National Laboratories, University of California, Berkeley, Alcatel-Lucent (France)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4320930010

FWCI: 1.466

Cites: 6

Cited by: 1

Related to: 10