Work

0.33 NA EUV systems for high volume manufacturing

Year: 2023

Type: conference-paper

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.2658046

Authors: Christophe Smeets, Nico Benders, Frank Bornebroek, Joe Carbone, Roderik Van Es, Arthur Minnaert, Guido Salmaso, Stuart Young

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4367308323

FWCI: 7.682

Cites:

Cited by: 17

Related to: 10