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Stuart Young

Torus and Active Galactic Nucleus Properties of Nearby Seyfert Galaxies: Results From Fitting Infrared Spectral Energy Distributions and Spectroscopy
2011 · Almudena Alonso-Herrero, Cristina Ramos Almeida, et al. · The Astrophysical Journal · 226
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Spectropolarimetric Evidence for a Kicked Supermassive Black Hole in the Quasar E1821+643
2010 · Andrew Robinson, Stuart Young, et al. · The Astrophysical Journal Letters · 61
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Evidence for a 20 Parsec Disk at the Nucleus of Centaurus A
1998 · Ethan J. Schreier, Alessandro Marconi, et al. · The Astrophysical Journal · 53
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EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100
2011 · Christian Wagner, Jose Bacelar, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 32
From performance validation to volume introduction of ASML's NXE platform
2012 · Hans Meiling, Wim de Boeij, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26
Hubble Space TelescopeInfrared Imaging Polarimetry of Centaurus A: Implications for the Unified Scheme and the Existence of a Misdirected BL Lacertae Nucleus
2000 · Alessandro Capetti, Ethan J. Schreier, et al. · The Astrophysical Journal · 23
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Spectropolarimetry of broad Hα lines in radio galaxies: constraints on the geometry of the broad-line and scattering regions
2002 · Elizabeth A. Corbett, Andrew Robinson, et al. · Monthly Notices of the Royal Astronomical Society · 18
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0.33 NA EUV systems for high volume manufacturing
2023 · Christophe Smeets, Nico Benders, et al. · SPIE Optical and EUV Nanolithography · 17
Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
2011 · Gian F. Lorusso, Natalia Davydova, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Intra-field patterning control using high-speed and small-target optical metrology of CD and focus
2015 · Hugo Cramer, Stefan Petra, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
0.33 NA EUV systems for high-volume manufacturing
2024 · Peter Klomp, Roderik van Es, et al. · SPIE Optical and EUV Nanolithography · 4
NXE:3100 full wafer imaging performance and budget verification
2012 · Eelco van Setten, Koen van Ingen Schenau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
0.33 NA EUV systems for high volume manufacturing
2023 · Stuart Young, Pieter Gunter, et al. · International Conference on Extreme Ultraviolet Lithography · 3
Lithography performance and simulation accuracy at different polarization states for sub 40nm node
2008 · Ki-Yeop Park, Ho-young Kang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Improving focus performance at litho using diffraction-based focus metrology, novel calibration methods, interface, and control loop
2016 · Jiarui Hu, Y. L. Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Science of active galactic nuclei with the GTC and CanariCam
2008 · Nancy A. Levenson, Christopher C. Packham, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
EUV lithography introduction at Chipmakers
2011 · Christian Wagner, Jose Bacelar, et al. · International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA)
Works count: 18
Citation count: 494
H-index: 9
I10-index: 9
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