Work

0.33 NA EUV systems for high-volume manufacturing

Year: 2024

Type: conference-abstract

Source: SPIE Optical and EUV Nanolithography

DOI: 10.1117/12.3014165

Authors: Peter Klomp, Roderik van Es, Stuart Young, Christophe Smeets

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4394597259

Cites:

Cited by: 4

Related to: 10