Work

Impact of Ion Energy and Yield in Oblique Ion Beam Etching Process for Blazed Gratings

Year: 2024

Type: conference-paper

Source: International Conference on Simulation of Semiconductor Processes and Devices

DOI: 10.1109/sispad62626.2024.10733316

Authors: T. Reiter, A. Toifl, S. W. Kong, A. Hessinger, L. Filipovic

Institutions: TU Wien, Silvaco (United Kingdom), Silvaco Group, Inc. (United States)

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Christian Doppler Forschungsgesellschaft

OpenAlex ID: W4403937795

FWCI: 3.846

Cites: 9

Cited by: 2

Related to: 10