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Double Spacer LOCOS Process with Shallow Recess of Silicon for 0.20 μm Isolation

Year: 1996

Type: conference-paper

Source: International Conference on Solid State Devices and Materials (SSDM)

DOI: 10.7567/ssdm.1996.b-1-4

Authors: Byung-Jin Cho, Se-Aug Jang, Tae-Sik Song, Seung-Ho Pyi, Jong-Choul Kim

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W575714769

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