Work

SCFD(Supercritical Fluid Deposition)によるSiO2薄膜の合成

Year: 2006

Type: article

DOI: 10.11491/scej.2006f.0.909.0

Authors: 智弘大久保, 健百瀬, 正和杉山, 幸浩霜垣

Language: Japanese

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W628459980

FWCI:

Cites:

Cited by:

Related to: 10