Work

Metal organic chemical vapor deposition (MOCVD) of oxides and ferroelectric materials

Year: 2002

Type: article

Source: Journal of Materials Science Materials in Electronics

DOI: 10.1023/a:1020618411750

Authors: P. J. Wright, M. J. Crosbie, P. A. Lane, D. J. Williams, A. C. Jones, T. J. Leedham, H. O. Davies

Institutions: Qinetiq (United Kingdom), University of Liverpool

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W70410639

FWCI: 0.7

Cites: 35

Cited by: 30

Related to: 10