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Hywel O. Davies

Observed names: D. Hywel, Davies, H, Davies, H., Davies, H.O., Davies, Hywel O., H. Davies, H. O. Davies, H. P. Davies, H.O Davies, H.O. Davies, Hywel Davies, Hywel O Davies, HywelO Davies, Hywell O Davies
Observed institutions: Royal College of Surgeons in Ireland, University of Liverpool, Queen Mary University of London, University of Oxford, ACAL Energy (United Kingdom), University College London, Imperial College London, Cardiff University, University of Wales
ORCID: 0000-0002-8475-0161
Observed ORCID: 0000-0002-8475-0161
OpenAlex ID: A5111921365
Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films
2002 · P.A. Williams, J.L. Roberts, et al. · Chemical Vapor Deposition · 98
Nickel oxide sol–gel films from nickel diacetate for electrochromic applications
2003 · J.L Garcia-Miquel, Q Zhang, et al. · Thin Solid Films · 92
Aerosol Assisted Chemical Vapor Deposition of In2O3 Films from Me3In and Donor Functionalized Alcohols
2007 · Siama Basharat, Claire J. Carmalt, et al. · Inorganic Chemistry · 64
Crystal Structure of Bi(OCMe2CH2OMe)3 and Its Use in the MOCVD of Bi2O3
2001 · P. A. Williams, A. C. Jones, et al. · Chemical Vapor Deposition · 63
Interface of ultrathin HfO2 films deposited by UV-photo-CVD
2004 · Q. Fang, J.-Y. Zhang, et al. · Thin Solid Films · 59
Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD
2003 · Q. Fang, J.-Y. Zhang, et al. · Thin Solid Films · 54
Ce(IV) Complexes with Donor-Functionalized Alkoxide Ligands: Improved Precursors for Chemical Vapor Deposition of CeO2
2011 · Helen C. Aspinall, John Bacsa, et al. · Inorganic Chemistry · 51
Atomic layer deposition of ZrO2 thin films using a new alkoxide precursor
2002 · R. Matero, M. Ritala, et al. · Journal of Non-Crystalline Solids · 49
Novel mononuclear zirconium and hafnium alkoxides; improved precursors for the MOCVD of ZrO2 and HfO2
2001 · Paul A. Williams, John L. Roberts, et al. · Journal of Materials Chemistry · 48
MOCVD of Strontium Tantalate Thin Films Using Novel Bimetallic Alkoxide Precursors
1999 · Michael J. Crosbie, Peter J. Wright, et al. · Chemical Vapor Deposition · 48
Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition
2011 · P.J. King, M. Werner, et al. · Thin Solid Films · 39
Syntheses, X-ray structures and CVD studies of diorganoalkoxogallanes
2008 · Siama Basharat, Claire J. Carmalt, et al. · Journal of Organometallic Chemistry · 37
Synthesis of Group 13 Sesquialkoxides and Their Application as Precursors to Crystalline Oxide Films
2006 · Siama Basharat, William Betchley, et al. · Organometallics · 37
Growth of Hafnium Dioxide Thin Films by Liquid‐Injection MOCVD Using Alkylamide and Hydroxylamide Precursors
2003 · P.A. Williams, A.C. Jones, et al. · Chemical Vapor Deposition · 37
Synthesis and crystal structures of dimethylaminoethanol adducts of Ni(ii) acetate and Ni(ii) acetylacetonate. Precursors for the sol–gel deposition of electrochromic nickel oxide thin films
2001 · Paul A. Williams, Anthony C. Jones, et al. · Journal of Materials Chemistry · 37
MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor
2009 · Jacqueline S. Wrench, Kate Black, et al. · Chemical Vapor Deposition · 34
Characterisation of HfO2 deposited by photo-induced chemical vapour deposition
2003 · Q. Fang, J.-Y. Zhang, et al. · Thin Solid Films · 33
Liquid Injection MOCVD of Zirconium Dioxide Using a Novel Mixed Ligand Zirconium Precursor
1998 · Anthony C. Jones, Timothy J. Leedham, et al. · Chemical Vapor Deposition · 32
Synthesis of Zirconium Guanidinate Complexes and the Formation of Zirconium Carbonitride via Low Pressure CVD
2009 · Stephen E. Potts, Claire J. Carmalt, et al. · Organometallics · 31
Atomic Layer Deposition of Strontium Tantalate Thin Films from Bimetallic Precursors and Water
2004 · Marko Vehkamäki, Mikko Ritala, et al. · Journal of The Electrochemical Society · 31
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Synthesis of trans-bis (glycinehydroxamato) platinum (II) hydrate tans-dichlorobis (glycylglycine) platinum (II) dihydrate and the crystal and molecular structures of trans-dichlorobis (glycine) platinum (II) dihydrate and trans, trans-dichlorobis (glycinato) platinum (IV), hydrolysis products formed in reactions of the former complexes
1995 · Hywel O. Davies, David A. Brown, et al. · Inorganica Chimica Acta · 31
Metal organic chemical vapor deposition (MOCVD) of oxides and ferroelectric materials
2002 · P. J. Wright, M. J. Crosbie, et al. · Journal of Materials Science Materials in Electronics · 30
Thermal stability studies for advanced Hafnium and Zirconium ALD precursors
2007 · Simon Rushworth, Kathleen Coward, et al. · Surface and Coatings Technology · 27
Some tantalum(V) β-diketonate and tantalum(V) aminoalcoholate derivatives potentially important in the deposition of tantalum-containing materials
1999 · Hywel O. Davies, Timothy J. Leedham, et al. · Polyhedron · 27
Metalorganic chemical vapour deposition (MOCVD) of zirconia and lead zirconate titanate using a novel zirconium precursor
1999 · Anthony C Jones, Timothy J Leedham, et al. · Journal of the European Ceramic Society · 27
Works count: 133
Citation count: 1,593
H-index: 26
I10-index: 51
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