Work

Surface modification by chlorine-chemistry during atomic layer etching of aluminum nitride: A first principles-based analysis

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0004975

Authors: Sanjay Nayak, Nikolai Andrianov, Thomas Gruhn, Joaquín Miranda

Institutions: Silicon Austria Labs (Austria), University of Bayreuth

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7119524176

FWCI: 1.766

Cites: 50

Cited by: 1

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