Work

Spatio-temporal Forecasting of Plasma Etch Profiles via Physics-informed Deep Learning

Year: 2026

Type: preprint

Source: SSRN Electronic Journal

DOI: 10.2139/ssrn.7355982

Authors: Chih-Yu (Andrew) Lai, Jinwoo Park, Junsoo Ha, Seunghyun Yoon, Duane Boning, Michael McIlrath, Rachel Owens

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W7204258624

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