Work

High rate deposition of amorphous hydrogenated silicon using an expanding thermal plasma

Year: 1997

Type: article

Source: TU/e Research Portal

Authors: RJ René Severens, Wmm Erwin Kessels, L Gabella, van de Frank Pas, M. C. M. van de Sanden, DC Daan Schram

Language: English

Topic: Thin-Film Transistor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W747337906

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