Author

Lokesh Subramany

Observed names: Subramany Lokesh, Subramany, Lokesh

Observed institution: GlobalFoundries (United States)

OpenAlex ID: A5003366414

Signal response metrology (SRM): a new approach for lithography metrology

2015 · Stilian Pandev, Fang Fang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

Implementation of hybrid metrology at HVM fab for 20nm and beyond

2013 · Alok Vaid, Lokesh Subramany, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Analysis of wafer heating in 14nm DUV layers

2016 · Lokesh Subramany, Woong Jae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Integrated production overlay field-by-field control for leading edge technology nodes

2014 · Woong Jae Chung, John Tristan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Advanced overlay: sampling and modeling for optimized run-to-run control

2016 · Lokesh Subramany, WoongJae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

CPE run-to-run overlay control for High Volume Manufacturing

2015 · Lokesh Subramany, Woong Jae Chung, et al. · ASMC proceedings · 6

Overlay optimization for 1x node technology and beyond via rule based sparse sampling

2016 · Nyan L. Aung, Woong Jae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors

2016 · Haiyong Gao, Woong Jae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Run time scanner data analysis for HVM lithography process monitoring and stability control

2014 · Woong Jae Chung, Young Ki Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Lithography focus/exposure control and corrections to improve CDU at post etch step

2014 · Young Ki Kim, Mark Yelverton, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Investigation of trench and contact hole shrink mechanism in the negative tone develop process

2013 · Sohan Singh Mehta, Craig Higgins, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Alignment solutions on FBEOL layers using ASML scanners

2017 · Pavan Samudrala, Gregory Hart, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Process variation challenges and resolution in the negative-tone develop double patterning for 20nm and below technology node

2015 · Sohan S. Mehta, Lakshmi K. Ganta, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

HVM capabilities of CPE run-to-run overlay control

2015 · Lokesh Subramany, Woong Jae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

High order wafer alignment for 20nm node logic process

2013 · Bumhwan Jeon, Shyam Pal, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Gpu Based Lithography Simulation and Opc

2023 · Subramany, Lokesh · ScholarWorks@UMassAmherst (University of Massachusetts Amherst) · 2

Journey to a Big Data Analysis Platform: Are we there yet?

2021 · Raymond Goss, Lokesh Subramany · ASMC proceedings · 2

Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials

2018 · Pavan Samudrala, Gregory Hart, et al. · ASMC proceedings · 1

Novel methodology to optimize wafer alignment to enhance 14nm on product overlay

2017 · Pavan Samudrala, Woong Jae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Evaluation of lens heating effect in high transmission NTD processes at the 20nm technology node

2014 · Bumhwan Jeon, Sam Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

20nm MOL overlay case study

2014 · Lokesh Subramany, Michael Hsieh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials

2018 · Samudrala Pavan, H.R. Gregory, et al. · IEEE Conference Proceedings

Scanner baseliner monitoring and control in high volume manufacturing

2016 · Pavan Samudrala, Woong Jae Chung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Overlay target selection for 20-nm process on A500 LCM

2015 · Vidya Ramanathan, Lokesh Subramany, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 24

Citation count: 109

H-index: 6

I10-index: 3