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Hiroshi Yanagita

Observed names: H Yanagita, H. Yanagita, 博史 柳田
ORCID: 0000-0002-4263-324X
Observed ORCID: 0000-0002-4263-324X
OpenAlex ID: A5004400551
Vibrational spectra of hydrogen on the Rh(111) surface
1999 · H. Yanagita, H. Fujioka, et al. · Surface Science · 35
Quantum delocalization of H on Pd(110): A vibrational study
1996 · N. Takagi, Y. Yasui, et al. · Physical review. B, Condensed matter · 25
A Perpetuum Mobile 32bit CPU with 13.4pJ/cycle, 0.14µA sleep current using Reverse Body Bias Assisted 65nm SOTB CMOS technology
2014 · Koichiro Ishibashi, Nobuyuki Sugii, et al. · IEEE Symposium in Low-Power and High-Speed Chips (COOL CHIPS) · 22
Adsorbed states of H on Ni(111) at 100 K: A vibrational study
1997 · H. Yanagita, J. Sakai, et al. · Physical review. B, Condensed matter · 17
Ultralow-voltage design and technology of silicon-on-thin-buried-oxide (SOTB) CMOS for highly energy efficient electronics in IoT era
2014 · Shiro Kamohara, Nobuyuki Sugii, et al. · Symposium on VLSI Technology · 12
Maximum Permissible EB Acceleration Voltage for SEM-Based Inspection Before Electrical Characterization of Advanced MOS
2007 · Takayuki Mizuno, Miho Takahashi, et al. · IEEE International Reliability Physics Symposium proceedings · 10
Reliability and scalability of FinFET split-gate MONOS array with tight Vth distribution for 16/14nm-node embedded flash
2017 · S. Tsuda, T. Saito, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 9
Impact of Homogeneously Dispersed Al Nanoclusters by Si-monolayer Insertion into Hf0.5Zr0.5O2 Film on FeFET Memory Array with Tight Threshold Voltage Distribution
2019 · K. Maekawa, T. Yamaguchi, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 7
A chemical underlayer approach to mitigate shot noise in EUV contact hole patterning
2014 · Jin Li, Ide Yasuaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Sub-6V Operation of Split-Gate Type Charge-Trapping Nonvolatile Memory with High-k Trapping and Blocking Layers for High-Speed and HighlyReliable Embedded Flash
2020 · Y. Z. Wang, A. Amo, et al. · IEEE International Memory Workshop (IMW) · 3
The novel materials for pattern growing on EUV resists
2023 · Hiroshi Yanagita, Kazuma Yamamoto · Advances in Patterning Materials and Processes · 2
Study on rinse material for pattern collapse mitigation in EUV lithography
2022 · Kazuma Yamamoto, Hiroshi Yanagita, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Realization of “skeleton wafer” testing for electrical failure analysis
2018 · Hiroshi Yanagita, Akihito Jingu, et al. · IEEE International Symposium on Semiconductor Manufacturing conference proceedings · 2
Cost-Effective and Time-Efficient Failure Analysis Method for Yield Enhancement Utilizing Picked Sawn Wafer
2019 · Hiroshi Yanagita, Akihito Jingu, et al. · IEEE Transactions on Semiconductor Manufacturing · 1
First Implementation of MONOS Flash Memory in SOTB-CMOS
2018 · K. Maekawa, H. Makiyama, et al. · International Conference on Solid State Devices and Materials (SSDM) · 1
招待講演 : A Perpetuum Mobile 32bit CPU with 13.4pJ/cycle, 0.14μA Sleep Current using Reverse-Body-Bias Assisted 65nm SOTB CMOS Technology (シリコン材料・デバイス)
2014 · Koichiro Ishibashi, Nobuyuki Sugii, et al. · IEICE technical report. Speech · 1
Material-Dependent SDL Behavior of Cu-Void Defects: An Integrated Electrical and Physical Failure Analysis
2026 · Toru Takahashi, Akiko Hisasue, et al. · Proceedings - International Symposium for Testing and Failure Analysis
Implementation of FeFET Memory Device Utilizing Highly Reliable Ferroelectric Hf0.5Zr0.5O2 Film with Embedded Al Nanoclusters
2019 · T. Ohara, T. Yamaguchi, et al. · International Conference on Solid State Devices and Materials (SSDM)
Reliability and Scalability of FinFET Split-Gate MONOS Array with Tight Vth Distribution for 16/14nm-node Embedded Flash
2018 · Shibun Tsuda, Tomoya Saito, et al. · IEICE Technical Report; IEICE Tech. Rep.
Wide Range Image-shift Functions in SEM for Probing Applications
2005 · T Agemura, M Sato, et al. · Microscopy and Microanalysis
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Development of Failure Analysis Method Using Nano-prober and TEM
2004 · Fumiko Yano, Hiroshi Yanagita, et al. · 電子情報通信学会技術研究報告. ICD, 集積回路
Adsorbed states of H on Ni(111) and Rh(111) surfaces
2000 · 博史 柳田 · Kyoto University Research Information Repository (Kyoto University)
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Works count: 22
Citation count: 153
H-index: 7
I10-index: 6
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