Get started
Author

Paul A. Blackborow

Observed names: P. Blackborow, Paul Blackborow
OpenAlex ID: A5008272985
Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development
2006 · Stephen F. Horne, Matthew M. Besen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 31
Extreme-ultraviolet light source development to enable pre-production mask inspection
2012 · Matthew Partlow, Matthew Besen, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 29
Surface Characteristics of Monocrystalline ß-SiC dry etched in fluorinated gases
1986 · John W. Palmour, R. F. Davis, et al. · MRS Proceedings · 22
EUV source development at Energetiq
2008 · Paul A. Blackborow, Matthew J. Partlow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist
2007 · Paul A. Blackborow, Deborah S. Gustafson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
High brightness electrodeless Z-Pinch EUV source for mask inspection tools
2012 · Stephen F. Horne, Matthew J. Partlow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Study on photochemical analysis system (VLES) for EUV lithography
2007 · A. Sekiguchi, Y. Kono, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6
Large-area low-frequency discharge-produced a-Si:H
1982 · G.J. Smith, W.I. Milne, et al. · Electronics Letters · 6
Development of a high-pulse-rate EUV source
2009 · Stephen F. Horne, Fred M. Niell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Flexibility of microwave plasma chemical vapour deposition for diamond growth
1995 · B. Schulte, H. Juergensen, et al. · Surface and Coatings Technology · 5
EUV source development for AIMS and blank inspection
2010 · Paul A. Blackborow, Matthew J. Partlow, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Laser-Driven Light Sources for Nanometrology Applications
2019 · Huiling Zhu, Paul Blackborow · Journal of Microelectronic Manufacturing · 3
EQ-10 electrodeless Z-pinch EUV source for metrology applications
2011 · Deborah Gustafson, Stephen F. Horne, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications
2011 · Stephen F. Horne, Deborah Gustafson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
WHOLE CELL TOMOGRAPHY/MOLECULAR BIOLOGY/STRUCTURAL BIOLOGY: Affordable x-ray microscopy with nanoscale resolution
2013 · James Evans, Paul A. Blackborow, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) · 1
The EQ-10 Electrodeless Z-Pinch™ Metrology Source
2018 · Stephen F. Horne, Matthew M. Besen, et al. · SPIE eBooks
Affordable x-ray microscopy with nanoscale resolution
2013 · James Evans, Paul A. Blackborow, et al.
Metrology Sources for EUV Lithography
2013 · Steve Horne, Paul Blackborow, et al. · Conference on Lasers and Electro-Optics
Large Area Hydrogenated Amorphous Silicon for Photovoltaic Application
1982 · G. J. Smith, W. I. Milne, et al. · Springer eBooks
Works count: 20
Citation count: 148
H-index: 6
I10-index: 5
Year
Topic
Type