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Dorothe Oorschot
Observed names:
D. Oorschot,
Oorschot Dorothe
Institution:
ASML (Netherlands)
Observed institution:
ASML (Netherlands)
OpenAlex ID:
A5012418847
Experimental approach to EUV imaging enhancement by mask absorber height optimization
2013
·
Natalia Davydova
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
27
Mask aspects of EUVL imaging at 27nm node and below
2011
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
16
Impact of an etched EUV mask black border on imaging: part II
2013
·
Natalia Davydova
, Robert de Kruif
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
EUV mask stack optimization for enhanced imaging performance
2010
·
Eelco van Setten
, Dorothe Oorschot
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Imaging performance improvements by EUV mask stack optimization
2011
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
10
Characterization of ArF immersion process for production
2005
·
Jeng-Horng Chen
, Li-Jui Chen
, et al.
·
Optical Microlithography XVIII
·
10
Patterning options for N7 logic: prospects and challenges for EUV
2015
·
Eelco van Setten
, Friso Wittebrood
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond
2014
·
Natalia Davydova
, Eelco van Setten
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV
2014
·
Eelco van Setten
, Guido Schiffelers
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
9
Improved fab CDU with FlexRay and LithoTuner
2011
·
Robert Socha
, Wenjin Shao
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Measurement of image fading impact on 20P40 contact hole LCDU
2023
·
Sam Borman
, Dominykas Gustas
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
5
NXE:3300B platform: imaging applications for Logic and DRAM
2013
·
Eelco van Setten
, Guido Schiffelers
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Extending EUV lithography for DRAM applications
2020
·
Gijsbert Rispens
, Claire Van Lare
, et al.
·
SPIE Conference on Extreme Ultraviolet (EUV) Lithography
·
4
LCDU decomposition and scaling: mask and resist effects on local MEEF and stochastics
2024
·
Dominykas Gustas
, Sam Borman
, et al.
·
International Conference on Extreme Ultraviolet Lithography
·
3
Holistic lithography for EUV: NXE:3100 characterization of first printed wafers using an advanced scanner model and scatterometry
2011
·
Frank A. J. M. Driessen
, Natalia Davydova
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
2
Using FlexRay in Computational Lithography
2011
·
Robert Socha
, Wenjin Shao
, et al.
·
Japanese Journal of Applied Physics
·
2
PDF
Massive metrology and failure identification for DRAM applications (Conference Presentation)
2019
·
Harm Dillen
, Dorothe Oorschot
, et al.
·
Metrology, Inspection, and Process Control XXXVI
·
1
Improvements in the imaging performance of a high volume manufacturing EUV scanner with a special emphasis on the added value of the new illuminator for increased pupil flexibility
2017
·
Bartosz Bilski
, Erik Wang
, et al.
·
European Mask and Lithography Conference (EMLC)
·
1
ブラックボーダー,マスク3D効果:22nmノードとそれを超えるEUVマスクアーキテクチャのカバーリング課題
2014
·
Davydova Natalia
, Van Setten Eelco
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
19
Citation count:
144
H-index:
9
I10-index:
6
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