Author

Jan Baselmans

Observed name: J. J. M. Baselmans

Observed institutions: Amsterdam UMC Location University of Amsterdam, ASML (Netherlands)

OpenAlex ID: A5015202066

Full optical column characterization of DUV lithographic projection tools

2004 · Mark A. van de Kerkhof, Wim de Boeij, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 60

Extending optical lithography with immersion

2004 · Bob Streefkerk, Jan Baselmans, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 35

Optimizing and enhancing optical systems to meet the low k 1 challenge

2003 · Donis G. Flagello, Robert J. Socha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24

Performance of a step-and-scan system for DUV lithography

1997 · Gerard de Zwart, Martin A. van den Brink, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24

Image quality in time-resolved transillumination of highly scattering media

1995 · D. G. Papaioannou, G. W. ’t Hooft, et al. · Applied Optics · 22

Speckle in optical lithography and its influence on linewidth roughness

2009 · Oscar Noordman, Andrey Tychkov, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 19

Optimum ArFi laser bandwidth for 10nm node logic imaging performance

2015 · Paolo Alagna, Omar Zurita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Ring test aberration determination and device lithography correlation

2001 · Cesar M. Garza, Sr., Will Conley, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Speckle in optical lithography and the influence on line width roughness

2009 · Oscar Noordman, Andrey Tychkov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

Lithographic process simulation for scanners

1998 · Andreas Erdmann, Michael Arnz, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Solution for high-order distortion on extreme illumination condition using computational prediction method

2015 · Young-Seog Kang, Hunhwan Ha, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

High-order distortion control using a computational prediction method for device overlay

2016 · Young Seog Kang, Cedric Affentauschegg, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 5

Lower BW and its impact on the patterning performance

2016 · Paolo Alagna, Greg Rechtsteiner, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Analysis of full-wafer/full-batch CD uniformity using electrical linewidth measurements

2001 · Peter Vanoppen, Oscar Noordman, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Advanced process characterization of a 10nm Metal 1 Logic layer using light source modulation and monitoring

2015 · Paolo Alagna, Omar Zurita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Dependence of image quality on optical parameters in time-resolved transillumination experiments

1994 · Gert W. t'Hooft, Dimitrios G. Papaioannou, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Exploring the challenges of pushing the resolution of DUV immersion lithography

2025 · Gerben Hopman, Remco Scheerder, et al. · SPIE Optical and EUV Nanolithography · 1

Impact of mask variations on CD and placement in resist: local versus global effects

2022 · Guillaume Mernier, Danielle Palmen, et al. · SPIE Optical and EUV Nanolithography · 1

Printing towards the resolution limit of DUV immersion lithography

2025 · Jette van den Broeke, Gerben Hopman, et al. · International Workshop on Advanced Patterning Solutions (IWAPS)

ArFi speckle reduction and impact on local CDU

2024 · Will Conley, Stephen Hsu, et al. · SPIE Optical and EUV Nanolithography

Optimum ArFi light source bandwidth for 10nm node logic imaging performance

2015 · Paolo Alagna, Omar Zurita, et al.

Works count: 21

Citation count: 251

H-index: 8

I10-index: 8