Get started
Author

Guido Schiffelers

Observed names: G. Schiffelers, Schiffelers Guido
Institution: ASML (Netherlands)
OpenAlex ID: A5019657501
ASML's NXE platform performance and volume introduction
2013 · Rudy Peeters, Sjoerd Lok, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 76
EUV lithography: NXE platform performance overview
2014 · Rudy Peeters, Sjoerd Lok, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 53
Next step in Moore’s law: high NA EUV system overview and first imaging and overlay performance
2024 · Jan van Schoot, Rob van Ballegoij, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 45
Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations
2019 · Joern-Holger Franke, Joost Bekaert, et al. · International Conference on Extreme Ultraviolet Lithography · 31
Assist features: placement, impact, and relevance for EUV imaging
2016 · Iacopo Mochi, Vicky Philipsen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300
2018 · Lieve van Look, Joost Bekaert, et al. · International Conference on Extreme Ultraviolet Lithography · 20
Impact of local variability on defect-aware process windows
2019 · Mark John Maslow, Hidetami Yaegashi, et al. · Extreme Ultraviolet (EUV) Lithography · 14
Tool-to-tool optical proximity effect matching
2008 · L. Van Look, Joost Bekaert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
EUV vote-taking lithography: crazy... or not?
2018 · Joost Bekaert, Eric Hendrickx, et al. · Extreme Ultraviolet (EUV) Lithography · 12
Spectral purity performance of high-power EUV systems
2020 · Mark A. van de Kerkhof, Fei Liu, et al. · SPIE Conference on Extreme Ultraviolet (EUV) Lithography · 10
PDF
Black border, mask 3D effects: covering challenges of EUV mask architecture for 22nm node and beyond
2014 · Natalia Davydova, Eelco van Setten, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Imaging performance and challenges of 10nm and 7nm logic nodes with 0.33 NA EUV
2014 · Eelco van Setten, Guido Schiffelers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Achievements and challenges of EUV mask imaging
2014 · Natalia Davydova, Eelco van Setten, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
2015 · N. Davydova, R. Kottumakulal, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
2019 · Pieter Vanelderen, Victor Blanco, et al. · Extreme Ultraviolet (EUV) Lithography · 7
High-NA imaging performance, a year of learnings after first light on wafer
2025 · Hilbert van Loo, Sofia Leitao, et al. · SPIE Optical and EUV Nanolithography · 6
EUV vote-taking lithography for mitigation of printing mask defects, CDU improvement, and stochastic failure reduction
2018 · Joost Bekaert, Peter De Bisschop, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 6
Single Exposure EUV of 32nm pitch logic structures: Patterning performance on BF and DF masks
2018 · Victor M. Blanco Carballo, Joost Bekaert, et al. · Extreme Ultraviolet (EUV) Lithography · 6
Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions
2019 · Gian F. Lorusso, Rispens Gijsbert, et al. · Metrology, Inspection, and Process Control XXXVI · 5
NXE:3300B platform: imaging applications for Logic and DRAM
2013 · Eelco van Setten, Guido Schiffelers, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Experimental proximity matching of ArF scanners
2008 · Joost Bekaert, L. Van Look, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
ARGES: Radial segregation and helical instabilities in metal halide lamps studied under microgravity conditions in the International Space Station
2005 · Gerrit Kroesen, Marco Haverlag, et al. · Microgravity Science and Technology · 3
High NA EUV has arrived, what are the upcoming challenges?
2025 · Jan van Schoot, Eelco van Setten, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging
2024 · Parul Dhagat, Sofia Leitao, et al. · International Conference on Extreme Ultraviolet Lithography · 2
NXE:3400B imaging performance assessed from a customer perspective
2018 · Friso Wittebrood, Guido Schiffelers, et al. · International Conference on Extreme Ultraviolet Lithography · 1
Works count: 26
Citation count: 378
H-index: 10
I10-index: 10
Year
Topic
Type