Author

Toshimitsu Akane

Observed names: Akane T., T. Akane

Observed institutions: Keio University, RIKEN

OpenAlex ID: A5021549493

Nonalloy Ohmic contact fabrication in a hydrothermally grown n-ZnO (0001) substrate by KrF excimer laser irradiation

2000 · Toshimitsu Akane, Koji Sugioka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 47

Influence of laser fluence and irradiation timing of F 2 laser on ablation properties of fused silica in F 2 -KrF excimer laser multi-wavelength excitation process

2001 · K. Obata, K. Sugioka, et al. · Applied Physics A · 25

KrF excimer laser induced ablation–planarization of GaN surface

1999 · T. Akane, K. Sugioka, et al. · Applied Surface Science · 24

Two-Step Doping Using Excimer Laser in Boron Doping of Silicon

1992 · Toshimitsu Akane, Takahiro Nii Takahiro Nii, et al. · Japanese Journal of Applied Physics · 20

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Multiwavelength excitation processing using F2 and KrF excimer lasers for precision microfabrication of hard materials

2002 · Koji Sugioka, Toshimitsu Akane, et al. · Applied Surface Science · 18

GaN ablation etching by simultaneous irradiation with F2 laser and KrF excimer laser

2001 · Toshimitsu Akane, Koji Sugioka, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 17

High-speed etching of hexagonal GaN by laser ablation and successive chemical treatment

1999 · T. Akane, K. Sugioka, et al. · Applied Physics A · 16

Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F_2 and KrF excimer lasers

2002 · Kotaro Obata, Koji Sugioka, et al. · Optics Letters · 15

Surface passivation of GaAs using ArF excimer laser in a H2S gas ambient

1993 · N. Yoshida, S. Chichibu, et al. · Applied Physics Letters · 11

F2 laser etching of GaN

2000 · T. Akane, K. Sugioka, et al. · Applied Surface Science · 8

X-ray photoelectron spectroscopic study of KrF excimer laser nitrided InP surface

2001 · Toshimitsu Akane, Koji Sugioka, et al. · Journal of Applied Physics · 7

Modification of refractive index in Ag/Na ion-exchanged glasses by vacuum-ultraviolet pulse laser irradiation

2001 · S. Ruschin, K. Sugioka, et al. · Applied Physics Letters · 6

Micromachining of SiC by femtosecond laser ablation

2002 · N. Aoki, K. Sugioka, et al. · Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR) · 2

GaN etching by simultaneous irradiation of KrF excimer laser and F 2 laser

2001 · Toshimitsu Akane, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

F 2 laser ablation of GaN

2000 · Toshimitsu Akane, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

GaN micromachining by short wavelength pulsed laser irradiation

2002 · Toshimitsu Akane, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Multiwavelength excitation process of fused-silica by combination of F 2 and KrF excimer lasers

2001 · Kotaro Obata, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

157 nm-248 nm multiwavelength excitation processing for application in optoelectronic manufacturing

2002 · K. Obata, K. Sugioka, et al. · Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR)

High-efficiency refractive index modification of fused silica by F 2 and KrF excimer laser multiwavelength excitation process

2002 · Kotaro Obata, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Laser processing of ion-exchange waveguides in glass

2002 · Shlomo Ruschin, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

WITHDRAWN: Multiwavelength excitation processing using F2 and KrF excimer lasers for precision microfabrication of hard materials

2002 · Koji Sugioka, Toshimitsu Akane, et al. · Applied Surface Science

Characterization of fused silica ablation by F 2 -KrF excimer laser multiwavelength excitation process

2002 · Kotaro Obata, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

レーザーアブロセシング

2001 · Tetsumi Watanabe, Takeyoshi Nakayama, et al. · The Review of Laser Engineering

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Pulsed laser nitridation of InP

2000 · Naoko Aoki, Toshimitsu Akane, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

KrF-excimer-laser-induced ohmic metallization of ZnO substrate

2000 · Toshimitsu Akane, Koji Sugioka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Works count: 31

Citation count: 222

H-index: 9

I10-index: 9